| |
Updated May 25,
2007
InP is used as the
substrate for some very high performance semiconductors using indium
gallium arsenide. InP technology supports both HEMTs and HBTs.
Some of this info
came from Russia's
Ioffe Institute.
| Formula or Composition: |
InP |
Dielectric Constant
( ):
|
12.4 |
Dissipation
Factor (a.k.a. loss tangent, or tan ): |
|
Temperature
Coefficient of : |
ppm/°C |
| Bulk Resistivity: |
-cm |
| Temperature
Coefficient of Resistivity (TCR): |
ppm/°C |
| Mass Density:
|
4.81 gr/cc |
| Specific Heat:
|
0.31 J/g/°C |
| Thermal Conductivity
(k): |
68 W/m°C |
| Temperature
Coefficient of Expansion (TCE): |
4.6 ppm/°C
|
| Melting Point |
1060°C
1940°F |
|
|